BTU International Introduces New Phosphorous Doping Technology

BTU International Inc. has introduced a new direct spray, phosphorous doping technology for photovoltaic processing at the 22nd European Photovoltaic Solar Energy Conference and Exhibition, September 3 – 7, Fiero Milano, Milan, Italy.

The new doper system features a nozzle-less, ultrasonic, direct spray system developed in conjunction with Ultrasonic Systems, Incorporated (USI). “This patented spray technology provides superior process uniformity,” said Bob Bouchard, BTU product marketing manager for alternative energy.

BTU has incorporated this new technology in a fully integrated, continuous diffusion line--also being introduced at the show--where it is combined with the company’s TFQ Series Quartz-Lined Diffusion Furnace.

According to BTU, the use of continuous processing offers reduced wafer handling and greater throughput than traditional batch processing. Reduced handling translates into lower breakage rates and improved yield. Typical processing times for the integrated doping and diffusion process are as short as 20 to 25 minutes. A single user interface for the doper and furnace controls simplify and streamline operation.

www.btu.com