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NEWS > APRIL 2010

DEK to Demonstrate Advanced Products and Processes at Nepcon Shanghai

9 April 2010

From the recently re-energized iX platform, through to comprehensive print process control tools and next generation stencil technologies, DEK announced that its display at Nepcon Shanghai offer visitors print productivity. Being held from 20th – 22nd April at the Everbright Convention and Exhibition Centre, the twentieth Nepcon Shanghai event will see DEK demonstrate a selection of advanced products and processes from the company's booth.

DEK will feature three pre-configured iX platforms – the Horizon 03iX, demonstrating high throughput materials deposition with PumpPrinting; the enhanced throughput Horizon 02iX, showcasing adhesive dispensing; and the highest throughput Horizon APiX, demonstrating advanced solder paste printing with accuracy and repeatability. The DEK team will also be on hand to talk to visitors about the company’s new Sentinel Photon platform.

Visitors to DEK's booth will also be able to see a wide range of the company's productivity tools on display, including ProFlow ATx enclosed head print system. DEK will also be using Nepcon Shanghai as a forum to demonstrate its VectorGuard stencil solutions. Finally, the company will also highlight a selection of its process improvement products including understencil cleaning rolls and understencil cleaning agents, each designed to boost productivity and yield, reduce risk of defects and minimize rework.

www.dek.com

 
 
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